TABLE 1<100> Silicon Etch Rates in [mm/hr] for Various KOH Concentrations and Etch Temperatures as Calculated from Eq

Appendix C

Si and SiO₂ Etch Rates in KOH

TABLE 1<100> Silicon Etch Rates in [mm/hr] for Various KOH Concentrations and Etch Temperatures as Calculated from Eq. [A-1] by Setting E₀ = 0.595 eV and k₀ = 2480 mm/hr · (mol/L)–^4.25
	Temperature [˚C]
% KOH	20˚	30˚	40˚	50˚	60˚	70˚	80˚	90˚	100˚

10	1.49	3.2	6.7	13.3	25.2	46	82	140	233
15	1.56	3.4	7.0	14.0	26.5	49	86	147	245
20	1.57	3.4	7.1	14.0	26.7	49	86	148	246
25	1.53	3.3	6.9	13.6	25.9	47	84	144	239
30	1.44	3.1	6.5	12.8	24.4	45	79	135	225
35	1.32	2.9	5.9	11.8	22.3	41	72	124	206
40	1.17	2.5	5.3	10.5	19.9	36	64	110	184
45	1.01	2.2	4.6	9.0	17.1	31	55	95	158
50	0.84	1.8	3.8	7.5	14.2	26	46	79	131
55	0.66	1.4	3.0	5.9	11.2	21	36	62	104
60	0.50	1.1	2.2	4.4	8.4	15	27	47	78

TABLE 2<100> Silicon Etch Rates in [mm/hr] for Various KOH Concentrations and Etch Temperatures as Calculated from Eq. [A-1] by Setting E₀ = 0.60 eV and k₀ = 4500 mm/hr · (mol/L)–^4.25
	Temperature [˚C]
% KOH	20 ˚	30˚	40˚	50˚	60˚	70˚	80˚	90˚	100˚

10	2.2	4.8	10.1	20.1	38	71	126	216	362
15	2.3	5.1	10.6	21.2	40	74	132	228	381
20	2.3	5.1	10.7	21.3	41	75	133	229	383
25	2.3	5.0	10.4	20.6	39	73	129	222	372
30	2.1	4.7	9.8	19.4	37	68	121	209	350
35	2.0	4.3	8.9	17.8	34	63	111	192	321
40	1.7	3.8	8.0	15.9	30	56	99	171	285
45	1.5	3.3	6.9	13.7	26	48	85	147	246
50	1.2	2.7	5.7	11.3	22	40	71	122	204
55	1.0	2.2	4.5	9.0	17	31	56	96	161
60	0.7	1.6	3.4	6.7	13	24	42	72	121

TABLE 3Calculated Etch Rates of Thermally Grown Silicon Dioxide in [nm/hr] for Various KOH Concentrations and Etch Temperatures. Calculation was Based on Best Numerical Fit of Experimental Data. The Activation Energy was Taken to be 0.85 eV
	Temperature [˚C]
% KOH	20˚	30˚	40˚	50˚	60˚	70˚	80˚	90˚	100˚

10	0.40	1.22	3.5	9.2	23	54	123	266	551
15	0.63	1.91	5.4	14.4	36	85	193	416	862
20	0.88	2.66	7.5	20.0	50	118	268	578	1200
25	1.14	3.46	9.8	26.0	65	154	348	752	1560
30	1.42	4.32	12.2	32.5	81	193	435	940	1950
35	1.44	4.37	12.4	32.8	82	195	440	949	1970
40	1.33	4.03	11.4	30.3	76	180	406	876	1820
45	1.21	3.67	10.4	27.5	69	163	369	797	1650
50	1.08	3.28	9.3	24.6	62	146	330	713	1480
55	0.95	2.87	8.1	21.6	54	128	289	624	1290
60	0.81	2.45	6.9	18.4	46	109	246	532	1100

Source: After Seidel et al., J. Electrochem. Soc., 137, 3612–26, 1990. With permission.