DC Discharges:

    1. Paschen Law.

    2. What is a glow discharge and what is it used for.

    3. When to use wet etching and when to use dry etching.

    4. Overview of plasma processing.

    5. Nice pictorial of various plasma set-ups.

    6. Structure of glow discharge (.pdf).

    7. Perspectives on plasmas.

    8. Basic Vacuum Technology Resources.

AC Discharges:

    1. RF vs DC.

    2. Plasma resources - linkpage.

Ion Beam Milling (IBM):

    1. IBM at Sarnoff.

    2. IBM compared with CAIBE and RIBE.

    3. Ion Beam Etch.

FIB:

    1. Images of FIB machined structures  .

    2. FIB literature.

    3. How a focused ion beam works.

    4. Report on FIB applications.(.pdf).

    5. Use of FIB at IBM.

RIE:

    1. Overview of various dry etching reactors.

    2. Powerpoint overview of RIE from UCB (.pdf).

    3. Dry Etching - Some Special Issues

DRIE:

    1. DRIE book.

    2. DRIE at Cronos.

CAIBE:

    1. CAIBE at Stuttgart.

    2. Ion source technology.

RIBE:

    1. Application of RIBE in thin film magnetic heads (.pdf).

    2. LiNbO3 Reactive Ion Beam Etching (RIBE).

    3. Ionfab 300 for RIBE.

Bosch Process:

    1. Europractice Robert Bosch GmbH.

    2. Alcatel.

    3. Oxford.

XeF₂:

     1. Introduction (from BSAC).

     2. XACTIX, Inc.

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